Trending

FMES-2 Fatty Acid Methyl Esters Ethoxylate Sulfonate CAS 71338-19-24

FMES is a sulfate anionic new surfactant. It is easily soluble, dispersible, compatible with hard water, and has high electrolyte stabil.Active matter content: 70% About Fatty Acid methyl Esters Ethoxylate Sulfonate The Fatty Acid methyl Esters E…

More>>

Sorbitan monooleate CAS 1338-43-8

Sorbitol, or sorbitolanhydride monoleate as it is also called, can be used to make a nonionic surfactant. About Sorbitan monooleate: It can also be used to make a nonionic detergent. Use as emulsion agent, textile oil, and oil residues dispersan…

More>>

Sorbitan monostearate CAS 1338-41-6

Sorbitan monostearate (also known as sorbitan monostearate) is a food ingredient prepared by esterifying stearic acids and sorbitol. About Sorbitan monostearate: The Ministry of Health of the People's Republic of China released the National Food S…

More>>

Consumers spent $133 billion on mobile apps in 2021 has a positive impact on the market for galaxy s5 active camera lens

Consumers spent $133 billion on mobile apps in 2021 has a positive impact on the market for product nam e As 2021 draws to a close, we tend to review the major events and developments of the past 12 months. Sensor Tower has released its annual mobile…

More>>

Related news

What are the applications of Nano Silicon Powder?

Silicon is the most promising kind of anode material in the next generation of lithium-ion batteries.…

More>>

High Purity Manganese Silicide MnSi2 Powder CAS 12032-86-9, 99%

Manganese silicide (also known as manganese silicide) is also called MnSi2. It has the same chemical formula as MnSi2. MnSi2 Powder is used in cemented carbide additives and high temperature structural materials. Purity: 99%Particle Size: 5-10um Ma…

More>>

Metal Alloy 5mm Thick Grind Surface Molybdenum Sputtering Target

Molybdenum Sputtering Target of 5mm Thickness, 99.95% Pure Molybdenum Sputtering Goal, Grind Surface Molybdenum Ziel About Metal Alloy 5mm Thick Grinding Surface Molybdenum Suttering Target Chemistry: Manufacturing process molybdenum d…

More>>

Metal Alloy 8.92g/Cm3 High Purity Polished Copper Plate

Metal Alloy High Density Tungsten Alloy Rod Grind Surface Tungsten Alloy Bar

High Purity Antimony Sulfide Sb2S3 Powder CAS 1314-87-0, 99.99%

Metal Alloy 18.5g/cm3 Polished Tungsten Heavy Alloy Plate

Metal Alloy 18g/cm3 High Density Tungsten Alloy Ball

High Purity Molybdenum Boride MoB2 Powder CAS 12006-99-4, 99%

High Purity Nano Hafnium Hf powder CAS 7440-58-6, 99%

High Purity 3D Printing Nickel Alloy IN718 Powder

High Purity Germanium Sulfide GeS2 Powder CAS 12025-34-2, 99.99%

High Purity 3D Printing Alloy CoCrW Powder

High Purity Tungsten Silicide WSi2 Powder CAS 12039-88-2, 99%

High Purity Titanium Sulfide TiS2 Powder CAS 2039-13-3, 99.99%

High Purity Calcium Nitride Ca3N2 Powder CAS 12013-82-0, 99.5%

High Purity Nano Ag Silver powder cas 7440-22-4, 99%

High Purity Chromium Diboride CrB2 Powder CAS 12007-16-8, 99%

High Purity 3D Printing Powder 15-5 Stainless Steel Powder

High Purity Silicon Sulfide SiS2 Powder CAS 13759-10-9, 99.99%

High Purity Magnesium Diboride MgB2 Powder CAS 12007-25-9, 99%

Supply Magnesium Granules Mg Granules 99.95%

High Purity Zirconium Nitride ZrN Powder CAS 25658-42-8, 99.5%