Titanium Sputtering targets are used frequently in flat display coatings, hardware tool coating, decorative coat, semiconductor components and for semiconductor components. This is why it's one of the key materials used in the preparation of integrated circuits.

High Purity Titanium Suttering Target for Metal Alloy:
Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911

Properties:
Titanium sputtering targets are made from titanium, which is known for its strength-toweight ratio. Titanium metal, a heavy metal that has low density is very strong. Because it has a high melting temperature (more than 1,650 degrees Celsius or 3,000 degrees Fahrenheit), this metal is useful for refractory purposes. Paramagnetic with low electrical and thermal conductivity, it is also paramagnetic.

Application:
This is a popular choice for flat panel displays, integrated circuits and DRAMS applications.

Payments & Transport:

Steel Alloy High Purity Ti Titanium Sputtering Target Property
Other Titles	The Titanium sputtering goal
	N/A
Compound Formula	Ti
Molecular Weight	N/A
Appearance	N/A
Melting Point	N/A
Solubility In Water	N/A
Density	N/A
Purity	99.6%
Size	Individualized
Boling Point	N/A
Specific Heat	N/A
Thermo Conductivity	N/A
Thermal Expansion	N/A
Young's Module	N/A
Exact	N/A
Monoisotopic	N/A
Steel Alloy Titanium Sputtering High Purity Target Health & Safety Information
Safety Notice	N/A
Hazard Statements	N/A
Flashing Point	N/A
Hazard Codes	N/A
Risk Codes	N/A
Safety statements	N/A
RTECS #	N/A
Transport Information	N/A
Germany	N/A

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